JPH071789Y2 - 縦型気相成長装置 - Google Patents
縦型気相成長装置Info
- Publication number
- JPH071789Y2 JPH071789Y2 JP1989011829U JP1182989U JPH071789Y2 JP H071789 Y2 JPH071789 Y2 JP H071789Y2 JP 1989011829 U JP1989011829 U JP 1989011829U JP 1182989 U JP1182989 U JP 1182989U JP H071789 Y2 JPH071789 Y2 JP H071789Y2
- Authority
- JP
- Japan
- Prior art keywords
- vapor phase
- phase growth
- lid member
- partition wall
- edge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000007740 vapor deposition Methods 0.000 title description 2
- 238000001947 vapour-phase growth Methods 0.000 claims description 64
- 239000000758 substrate Substances 0.000 claims description 51
- 238000005192 partition Methods 0.000 claims description 36
- 230000002093 peripheral effect Effects 0.000 claims description 26
- 238000007789 sealing Methods 0.000 description 32
- 239000007795 chemical reaction product Substances 0.000 description 30
- 239000007789 gas Substances 0.000 description 10
- 230000006866 deterioration Effects 0.000 description 4
- 238000000927 vapour-phase epitaxy Methods 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989011829U JPH071789Y2 (ja) | 1989-02-03 | 1989-02-03 | 縦型気相成長装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989011829U JPH071789Y2 (ja) | 1989-02-03 | 1989-02-03 | 縦型気相成長装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02102723U JPH02102723U (en]) | 1990-08-15 |
| JPH071789Y2 true JPH071789Y2 (ja) | 1995-01-18 |
Family
ID=31220726
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989011829U Expired - Fee Related JPH071789Y2 (ja) | 1989-02-03 | 1989-02-03 | 縦型気相成長装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH071789Y2 (en]) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6356004B2 (ja) * | 2014-08-05 | 2018-07-11 | 住友化学株式会社 | 反応容器の密閉構造、および基板処理装置 |
| JP6455480B2 (ja) | 2016-04-25 | 2019-01-23 | トヨタ自動車株式会社 | 成膜装置及び成膜方法 |
| US11251019B2 (en) | 2016-12-15 | 2022-02-15 | Toyota Jidosha Kabushiki Kaisha | Plasma device |
| CN107326340B (zh) * | 2017-08-29 | 2023-06-13 | 京东方科技集团股份有限公司 | 成膜设备 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63190327A (ja) * | 1987-02-03 | 1988-08-05 | Toshiba Corp | 気相成長装置 |
-
1989
- 1989-02-03 JP JP1989011829U patent/JPH071789Y2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02102723U (en]) | 1990-08-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |